[討論] FAB 中曝光機 (scanner) 的市佔率
想請問在黃光區的先進問題
一說到曝光機台廠商,原本都只想到 ASML
尤其是在先進製程上,下一代 EUV 大概也得靠他們
不過最近好奇看 NIKON 193i 的機台,才發現性能和 ASML 差不多
以下是兩家最新的193i機台比較:
ASML NXT:1980Di NIKON NSR-S631E
NA 0.85-1.35 1.35
Resolution ≦38nm ≦38nm
Field size 26*33 mm 26*33 mm
Overlay
(Single machine) ≦1.6 nm ≦1.7 nm
(Matched machine) ≦2.5 nm ≦2.3 nm
Throughput(96 shots) ≧275 WPH ≧270 (optional) WPH
Ref:
http://www.nikon.com/products/semi/lineup/pdf/NSR-S631E_e.pdf
https://goo.gl/EhfIsL
請問在業界這兩台都有人在用嗎?
還是先進製程主要仍以 ASML 居多? (N家幾乎都日本半導體廠自用?)
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※ FTICR:轉錄至看板 Electronics 03/10 22:38
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03/10 22:48, , 1F
03/10 22:48, 1F
確實也很好奇哪些部分是設備商負責哪些是FAB
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03/10 22:54, , 2F
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03/10 22:58, , 3F
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曝面板用的應該超大台XD 但resolution應該不用很高?
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03/10 23:02, , 4F
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好吧QQ
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兩家的 Overlay 差不多,確實可能是 dual-stage design 有差
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03/11 00:44, , 6F
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了解,感謝
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這就要問實際在用的工程師了...
※ 編輯: FTICR (219.70.186.32), 03/11/2017 01:10:25
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