[請益] 銀蝕刻液的問題
請問
我找到下列銀蝕刻液資料,
“silver base etch”(1:1:4 NH4OH:H2HO2:CH3OH) 氨水:雙氧水:甲醇
.36micron/min resist ok but rinse rapidly after etching
意思是光阻可擋住蝕刻液? 蝕刻後盡快清洗?(去光阻or? ??)
謝謝~
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